Puronon? family
High-speed cleaners the connector, leadframe, cable, and switch industries.
Puronon RTR
The most versatile reel-to-reel cleaner for high-speed plating lines.
Puronon LF
Designed for copper, copper alloys, and steel leadframes.
Puronon NP
Phosphate-free cleaner for enhanced environmental compatibility.
Puronon RTR ¨C Bestseller
Puronon RTR is a high-performance cleaner engineered for high-speed reel-to-reel plating lines, offering exceptional flexibility as a cathodic, anodic, or ultrasonic cleaner. Formulated specifically for copper, copper alloys, and steel, it delivers high conductivity, zero foaming, and excellent removal of oils, scale, and organic residues. Proven and trusted across the industry, Puronon RTR is qualified by major connector, cable, switch, and leadframe manufacturers, making it the benchmark choice for consistent, reliable surface preparation.
Puronon LF ¨C Universal cleaner
Puronon LF is designed for high-speed plating environments, supporting both reel-to-reel and strip-to-strip processes. It operates effectively as a cathodic, anodic, or ultrasonic cleaner, providing the versatility needed for modern, fast-cycle production lines. Optimized for copper, copper alloys, and steel, Puronon LF ensures high conductivity, low foaming, and superior oil and scale removal, contributing to stable downstream plating performance.
Puronon NP ¨C Phosphate free
Puronon NP is a phosphate-free, environmentally optimized cleaner tailored for high-speed reel-to-reel applications. Suitable for cathodic, anodic, and ultrasonic operation, it delivers the same high-performance cleaning profile as the rest of the Puronon family¡ªhigh conductivity, no foaming, and excellent removal of oils, residues, and scale. Its phosphate-free formulation reduces steel anode corrosion and effectively suppresses iron redeposition, ensuring longer bath life, improved process stability, and cleaner production.
What inspires us
Why we developed Puronon family solutions
Your challenge
In plating line operations, achieving a perfectly clean and active substrate surface is essential to ensure strong deposit adhesion and long-term corrosion resistance. However, organic and inorganic contaminants, including stamping oils and passivation residues, often hinder this goal. Current cleaning methods, such as soak, anodic and cathodic cleaning, require precise optimisation in order to effectively remove these contaminants without damaging delicate substrates. Furthermore, the cleaning process must be adapted to suit the particular substrate and production line design in order to achieve consistent, reproducible results.
Our solution
ÌÇÐĶ¯Âþvlog Atotech’s Puronon cleaners were developed to overcome these challenges through advanced alkaline formulations designed specifically for copper, copper alloys and steel. These high-performance cleaners deliver exceptional removal of oils, oxides and residues, ensuring optimal adhesion and corrosion protection. Qualified for use in connectors, leadframes, cables and switches, Puronon cleaners support both reel-to-reel and strip-to-strip production lines and are available in phosphate-free, borate-free and low-foam options. When combined with Uniclean 405 and ultrasonic support, Puronon cleaners maximise cleaning efficiency and process reliability, ensuring that substrates are perfectly prepared for tomorrow’s plating processes.
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